Technical Committee on Plasma Science and Technology
The Fundamentals and Materials Society in The Institute of Electrical Engineers of Japan

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The Technical Committee on Plasma Science and Technology was founded in April 1999. This committee has the basis on the plasma researcher's society that had organized Technical meeting on plasma science and technology in IEE Japan several times every year since about 30 years ago. The field of activity of this committee includes researches and investigations of various plasmas over wide ranges of their density, temperature, ionization degree, and applications such as nuclear fusion, plasma processing, and plasma chemistry.

Committee Member

Position
Name
Affiliation
Chair
Tatsuru SHIRAFUJI
Osaka City University
Committee
Seiji MUKAIGAWA
Iwate University
Naomichi ESUMI
University of Tsukuba
Ryuichiro Ohyama
Tokai University
Daisuke OGAWA
Chubu University
Kungen TEII
Kyushu University
Hirotake SUGAWARA
Hokkaido University
Kazuo SHIMIZU
Shizuoka University
Masaaki OKUBO
Osaka Prefecture University
Shinichi NAMBA
Hiroshima University
Toshifumi YUJI
University of Miyazaki
Mitsuaki MAEYAMA Saitama University
Haruhiko HIMURA Kyoto Institute of Technology
Organizer
Nozomi TAKEUCHI AIST
Ryuta ICHIKI
Oita University
Facilitator
Takuya KUWAHARA
Nippon Institute of Technology
on Aug 25, 2017

Contact: R. Ichiki, Oita Univ. ryu-ichiki [at] oita-u.ac.jp